Atomic Layer Depostion

Overexposure, Underexposure, or Correct Exposure?

The concept of surface exposure in ALD has proved useful in the discusson of film quality and production yield. Exposure is the product of time and partial pressure of a certain precursor above the growth surface. The longer the time - the higher the exposure. The higher the partial pressure - the higher the exposure.

What happens when the exposure is other than intended? ALD depends on the exposure just as much as CVD but in more subtle ways. Underexposure leads to ...................

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ALD Valve and Ampoule Monitoring?

As exposure times in ALD become ever more critical with valve opening times in the tens of milliseconds, the monitoring of the valve performace can enhance the production yield...........

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